MLA 150 Maskless Aligner

MLA 150 - Heidelberg Instruments

The MLA 150 Maskless Aligner is poised to revolutionize photolithography by offering an advanced, fast, and flexible solution that replaces traditional photomask techniques. With its high-resolution capabilities providing sub-micron accuracy, this aligner is designed for efficiency, making it ideal for rapid prototyping, advanced research, and low to mid-volume production. By utilizing a two-dimensional spatial light modulator (SLM), the MLA 150 directly exposes the resist-coated wafer, facilitating an unmatched ease of use and operational performance. Its application spans various sectors including MEMS, micro-optics, sensors, and electronic components, highlighting its versatility and effectiveness in nanofabrication environments.