Veeco Instruments Inc
Provides metrology and process equipment systems for industry leaders in the semiconductor, data storage, telecom/wireless and scientific/research markets.
- (516) 677-0200
- 1 Terminal Drive
Plainview, NY 11803
United States of America
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Product
Dual Filament Source
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Get the optimal thermal profile for different materials and situations with the Veeco Dual Filament Source. This source is designed for growing high-quality Ga- and In-containing materials, while preventing charge material recondensation and significantly reducing defects. Dual Filament Sources are available for use with both SUMO and conventional crucibles (including Group III production crucibles).
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Product
Selenium Valved Cracker
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This source has multiple heating zones that can either generate cracked or uncracked selenium flux while resisting the chemical attack from the corrosive vapor. The unrivaled convenience and flux control are maintained without depleting the source material via an all-metal needle valve. Excellent results have been reported producing blue/green LED and laser diode devices.
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Product
Medium-Temperature
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Medium-temperature processing systems deliver more thermal energy than low-temp tools can provide, without crossing into the stress-inducing range of high-temp processes. Operating between 200–600°C, they create the perfect balance for enabling critical film transformations, crystallization and adhesion. Medium-temperature MBE sources can be used for virtually any application—from hot-lip SUMO sources to standard filament for thermal effusion.
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Product
Dicing And Lapping Systems
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In semiconductor fabrication, clean die separation and smooth surfaces can make all the difference. While these steps might come late in the process, they play a major role in how well a device ultimately performs. Dicing and lapping bring the necessary level of precision to cut wafers into individual dies and polish surfaces so everything fits, functions and holds up the way it should in real world scenarios.
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Product
Gas and Vapor Delivery Systems
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In thin film deposition, high-quality results start with how process gases are delivered, as they help create the stable environment needed for consistency by controlling flow, pressure and composition to support processes like ALD, CVD, and PVD. Advanced semiconductor devices developed for the most advanced computing processes, such as AI and edge computing, need the ultra-high-purity environments of our gas and vapor deposition delivery systems.
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Product
ALD Services
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Our ALD Services help engineers optimize, troubleshoot, and scale their processes, covering everything from custom process development to equipment calibration and advanced film characterization.
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Product
High Temperature
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When low vapor pressure materials demand more heat to transform, Veeco’s high-temperature MBE sources step in. Built for thermal extremes, they power the kinds of reactions and structural changes that unlock next-level device performance.
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Product
Lithography Systems
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When it comes to shaping what a chip can do, lithography systems lead the way by transferring intricate circuit designs onto substrates with unmatched precision. From prototyping to high-volume manufacturing, these tools define the geometry of modern microchips, as well performance.
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Product
MOCVD Systems
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For growing high-quality compound semiconductor films, few techniques match the precision of Metal-Organic Chemical Vapor Deposition (MOCVD). They give engineers tight control over film composition and thickness, making them essential for optoelectronics and advanced power transistors.
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Product
MBE Components
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Engineered to exacting operational standards and designed to provide highly reliable, flexible performance, Veeco offers a range of MBE components.
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Product
MBE Sources
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Veeco offers MBE sources, including single- and dual-filament designs, tailored for numerous elements that require low, medium, or high temperatures.
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Product
Deposition Systems
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When a thin film requires the most stringent structural or compositional properties consistently across every layer, Veeco’s Ion Beam Deposition (IBD) technology is often the answer. Using a focused beam of ions to sputter material from a target, this physical vapor deposition technique builds dense, uniform films with standout adhesion and stability.
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Product
ALD Materials
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Chemists have synthesized many exciting new precursors for ALD and have created a large number of atomic layer deposition materials, such as coatings with improved properties for metals, semiconductors, insulators, oxides, nitrides, dielectrics, magnetic, and refractive coatings.
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Product
Downward-Looking SUMO Source For Gallium And Indium
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Attain large capacity, excellent flux uniformity, negligible shutter flux transients, and minimal depletion effects with Veeco’s Downward-Looking SUMO® Source for MBE. It combines a dual filament source with an asymmetric SUMO crucible featuring a narrow offset orifice and tapered exit cone with hot-lip heating. Result: excellent material quality, low defect counts, and good thickness uniformity. NOTE: This source is not for use with aluminum.
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Product
Laser Processing Systems
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Veeco delivers revolutionary Low-Cost-of-Ownership, HVM production-proven thermal annealing solutions at the most advanced technology nodes. Making a Material Difference with Leading Laser Spike Annealing Technology
