Veeco Instruments Inc
Provides metrology and process equipment systems for industry leaders in the semiconductor, data storage, telecom/wireless and scientific/research markets.
- (516) 677-0200
- 1 Terminal Drive
Plainview, NY 11803
United States of America
Categories
-
product
Wet Processing Systems
Surface preparation using sustainable practices is critical to ensuring the reliability of your advanced microelectronics destined for automotive applications, medical devices, 5G and cloud storage.
-
product
Ion Sources
Veeco offers the most comprehensive array of ion beam sources for a broad range of applications, including the industry's only Linear gridded sources.
-
product
Atomic Layer Deposition Systems
Atomic Layer Deposition (ALD) is a powerful way to build ultra-thin, super-precise coatings, one atomic layer at a time. It’s especially useful and efficient when working with tiny, complex 3D structures, making it a go-to technique in advanced semiconductor manufacturing.
-
product
High Temperature
When low vapor pressure materials demand more heat to transform, Veeco’s high-temperature MBE sources step in. Built for thermal extremes, they power the kinds of reactions and structural changes that unlock next-level device performance.
-
-
product
Selenium Valved Cracker
This source has multiple heating zones that can either generate cracked or uncracked selenium flux while resisting the chemical attack from the corrosive vapor. The unrivaled convenience and flux control are maintained without depleting the source material via an all-metal needle valve. Excellent results have been reported producing blue/green LED and laser diode devices.
-
product
Gridded DC Ion Sources
Ion-assisted processes like sputtering, etching, and surface treatment depend on a beam that’s stable, uniform, and tightly controlled. Gridded DC ion sources make that happen, giving engineers the precision they need to fine-tune ion energy and current density for reliable results.
-
product
Dicing And Lapping Systems
In semiconductor fabrication, clean die separation and smooth surfaces can make all the difference. While these steps might come late in the process, they play a major role in how well a device ultimately performs. Dicing and lapping bring the necessary level of precision to cut wafers into individual dies and polish surfaces so everything fits, functions and holds up the way it should in real world scenarios.
-
product
Corrosive Series Valved Cracker
With the superior flux control of the Corrosive Series Valved Cracker, complex structures not possible with conventional thermally controlled sources can be achieved. Mixed Group V layers of varying compositions can be grown without the frequent recalibration procedures necessary when using standard sources. SIMS analysis of a continuously graded GaAs1-xSbx layer demonstrates the excellent flux control available when using two Group V valved crackers, with identical results achieved at two different growth rates.
-
product
Low Temperature MBE
Low-temperature processing systems make it possible to handle advanced, delicate materials without subjecting them to high heat. By maintaining gentle thermal conditions, they unlock new possibilities for working with polymers, flexible films and other materials that can’t tolerate the extreme temperatures of conventional processing.
-
product
Gridless End-Hall Ion Sources
Veeco's Gridless End Hall Ion Sources provide high beam current for vacuum coating processes.
-
product
ALD
Atomic Layer Deposition (ALD) offers precise control down to the atomic scale.Atomic layer deposition holds tremendous promise across a wide array of industries, including energy, optical, electronics, nanostructures, biomedical, and more. Please check out our Applications section for more details in any and all of these areas.
-
product
ALD Periodic Table
The ALD Periodic Table is a visual guide to the elemental building blocks of atomic layer deposition. Organized by both chemistry and purpose, it helps engineers quickly find materials that meet their priorities, whether that’s conductivity, durability, clarity or thermal stability.
-
product
ALD For Research & Development
Veeco’s atomic layer deposition research systems are designed by ALD scientists and built for maximum experimental flexibility and value. With universal precursor delivery systems, you can use solid, liquid or gas chemistries in any precursor port. There are many options to choose from including ozone generators, in-situ monitoring and various configurations. As always, our team of ALD scientists are ready to answer your recipe development and film characterization questions. Over 2500 published academic papers feature research performed on our Savannah® thermal ALD system and Fiji® plasma ALD system.
-
product
Phosphorus Valved Cracker
The patented Valved Cracker for Phosphorus is uniquely tailored to provide a controlled and reproducible P2 flux from a solid phosphorus charge. The multi-zone crucible is designed for in situ conversion from commercially available red phosphorus to the more reactive white phosphorus with its advantageous evaporation characteristics.
