Vapor Deposition
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Vapor Concentration Monitor
IR-300 Series
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Metal-Organic Chemical Vapor Deposition (MOCVD) is widely used in the manufacture of LEDs, optical devices and other components. Liquid and solid precursors are delivered to the reaction chamber by controlling the temperature, pressure and the carrier gas flow rate (bubbling method). Process results can be affected by changes especially in temperature and liquid level. The in-line IR-300 Series measures and reports the precursor concentration in real time.
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GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
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The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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MOCVD Systems
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For growing high-quality compound semiconductor films, few techniques match the precision of Metal-Organic Chemical Vapor Deposition (MOCVD). They give engineers tight control over film composition and thickness, making them essential for optoelectronics and advanced power transistors.
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Deposition Systems
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When a thin film requires the most stringent structural or compositional properties consistently across every layer, Veeco’s Ion Beam Deposition (IBD) technology is often the answer. Using a focused beam of ions to sputter material from a target, this physical vapor deposition technique builds dense, uniform films with standout adhesion and stability.
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Ozone Gas Delivery Systems
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MKS ozone gas delivery systems provide field-proven, high concentration, ultra-clean ozone generation for advanced thin film applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), contaminant removal and oxide growth. Gas delivery models have integrated ozone concentration monitoring, flow control, and power distribution. Additional system options include safety monitoring, status indicators and ozone destruction capability.
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EpiStride SiC CVD System
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Veeco’s latest technology for the compound semiconductor market enables high-performance chemical vapor deposition of Silicon Carbide for both 6 and 8-inch wafer production. The platform enables a return to production in under 5 hours after routine cleaning maintenance. The EpiStride system’s high uptimes, short cycle times and overall stable performance lead to the lowest cost of ownership per wafer compared to competitive systems.
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ICP Plasma System
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The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Product
Dynamic Ultra Micro Hardness Tester
DUH-210/DUH-210S
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A new evaluation system for measuring the material strength of micro regions, such as semiconductors, LSI, ceramics, hard disks, vapor deposited films, and thin coating layers, not addressed by previous hardness testers. It can also be used to evaluate the hardness of plastics and rubbers. This instrument uniquely measures dynamic indentation depth, not the indentation after the test. This in turn permits measurement of very thin films and surface (treatment) layers that are impossible to measure with conventional methods. Additionally, this same method supplies the data needed to calculate elastic modulus on the test specimens.
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Matrix Vapor Deposition System
iMLayer
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The iMLayer matrix vapor deposition system is sample pretreatment (application of matrix) in order to perform MALDI-MS imaging using an analysis system such as the iMScope imaging mass microscope or the MALDI-7090. With the iMLayer, the deposition method has been adopted as a pretreatment method to achieve high spatial resolution. By using this method, fine matrix crystal can be produced. Also, thanks to automated control, the coating thickness is reproducibly controlled as users configure.
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High Temperature Absolute Pressure Transducers
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Our high temperature Baratron® capacitance manometers are controlled to temperatures of 150°C or higher for use use in demanding semiconductor manufacturing vacuum processes such as metal etching and nitride film chemical vapor deposition (CVD).
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Product
Ozone Gas Generators
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SEMOZON® Ozone gas generators and subsystems are the industry standard for compact, high concentration, ultra-clean ozone gas generation. Applications include Atomic Layer Deposition (ALD), Atomic Layer Etch (ALE), Chemical Vapor Deposition (CVD) and Wet Cleaning.
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Product
Ceramic Process Carrier Pallets
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Ceramic engineering specializing in Silicon Carbide, Boron Carbide, Alumina, Zirconia and Lead Zirconate Titanate (PZT) based ceramics, composites and thin films for High Strength, high temperature, semiconductive ceramic designed for use in wafer fabrication or hybrid circuits in vapor deposite ovens. Test Electronics will precision drill and customize pallets for your circuit board. Click on the Quote tab on the left then click on the Carrier Pallets tab to get an instant quotation on your process carrier pallets.
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Product
Gas and Vapor Delivery Systems
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In thin film deposition, high-quality results start with how process gases are delivered, as they help create the stable environment needed for consistency by controlling flow, pressure and composition to support processes like ALD, CVD, and PVD. Advanced semiconductor devices developed for the most advanced computing processes, such as AI and edge computing, need the ultra-high-purity environments of our gas and vapor deposition delivery systems.
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Physical Vapor Deposition Systems
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Physical Vapor Deposition (PVD) systems use physical processes, like sputtering and evaporation, to deposit thin films with exceptional purity and control. These techniques are widely used in semiconductor manufacturing, optical coatings and protective applications.
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Dynamic Scale Deposition Loop System
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Dynamic Scale Deposition Loop fully automated systems includes hardware and software to measure and evaluate the performance of scale inhibitors under high pressure and high temperature conditions.
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Reid Vapor Pressure Analyzers
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Increase your gasoline blending profits with process Reid Vapor Pressure measurements and automatic air saturation of the sample.
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Water Vapor Permeability Tester
WPT-304
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WPT-304 Water Vapor Permeability Tester is manufactured based on the gravimetric method and is applicable to test the water vapor transmission rate of plastic films, composite films, sheets, and other materials used in packaging, medical and constructive industry.
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Product
Vapor Tension Thermometer
RF60A
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UEi Test & Measurement Instruments
Farenheit and Celsius scale Vapor Tension thermometer
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Water Vapor Desorption Products
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RBD's vacuum chamber water vapor removal products include high-power, high temperature IR radiant bakeout emitters, and low-power, low temperature UVC emitters.
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Parylene Deposition Equipment
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SCS offers Parylene deposition systems that range from a portable laboratory unit to production models for high-volume manufacturing applications. SCS Parylene deposition systems are designed for accurate and repeatable operation, featuring closed-loop monomer pressure control, which ensures deposition of the polymer film at a precise rate. Whether researching new coating applications or developing structures out of Parylene in the laboratory, or coating components in a production environment, SCS leads the industry with its state-of-the-art Parylene deposition systems.
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Product
Particle Deposition Systems
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MSP’s 2300G3 Particle Deposition System sets the standards for wafer inspection and metrology equipment. This advanced tool is vital for increasing the yield of future leading-edge devices, while meeting the measurement needs of today.
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Product
Vapor Sorption Analysis
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Vapor Sorption Analysis is a technique in which a sample is subjected to varying conditions of humidity and temperature, and the response of the sample is measured gravimetrically. Understanding the effects of water content on structure and properties is critical in the development, processing and end use of a broad spectrum of materials. TA Instruments offers the most sensitive, versatile, and productive moisture sorption analyzers on the market. The Discovery SA combines a high-sensitivity thermobalance, innovative humidity control chamber, and reliable autosampler. Innovative technology combined with our unparalleled reputation for service and support make TA Instruments the clear choice of scientists worldwide for vapor sorption studies.
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Dynamic Vapor Sorption Analyzer
IGAsorp
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The IGAsorp is a fully automated compact benchtop DVS analyzer, for fast and accurate vapor sorption measurements using the dynamic flow technique for water and organic solvents. Measured vapor uptake isotherms and kinetics are used to characterize, test and evaluate materials in precisely defined environmental conditions.
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Water Vapor Sorption Analyzer
DVS Adventure
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DVS Adventure is a water vapor sorption analyzer that measures sorption and desorption isotherms over a broad range of humidities and temperatures. It offers unprecedented temperature stability and humidity performance.
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Product
Cold Vapor Atomic Fluorescence (CVAF) Mercury Analyzer
QuickTrace M‑8000
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The QuickTrace® M-8000 Cold Vapor Atomic Fluorescence (CVAF) mercury analyzer is ideal for ultra-trace to sub-mg/L mercury quantitation. Due to the high sensitivity of the M-8000, it easily achieves the ultra-trace detection limit of <0.05 ng/L total mercury that is demanded by customers following EPA method 1631. The QuickTrace® M-8000 is also versatile enough to analyze samples >400 µg/L without dilution in a research or industrial setting.
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Vapor Source Mass Flow Controller With Viscous Choked Flow
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The 1150C Vapor Source Mass Flow Controllers are pressure based measurement and control systems designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas using viscous flow through a choked orifice.
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Dual Vapor Gravimetric Sorption Analyzer
DVS Resolution
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DVS Resolution’s key feature is the combined ability to precisely control and measure temperature and relative humidity while recording the highest resolution changes in mass. DVS Resolution uses a dry carrier gas typically nitrogen or compressed air for its operation. Digital mass flow controllers regulate flows of dry and saturated gases. Relative humidity is generated by precisely mixing dry and saturated gas flows in desired flow ratios which produce expected relative humidity. In a typical experiment a known concentration of water vapor is delivered over a sample placed inside the sample pan connected to the Surface Measurement Systems Ultrabalance™ measuring realtime mass changes caused by sorption or desorption of water molecules. Prior to sorption measurements, the sample can be in-situ preheated/dried at temperatures of up to 300oC.
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Vapor Pressure Tester
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The MINIVAP laboratory and process vapor pressure analyzers are the worldwide accepted standard instruments for the determination of the vapor pressure of gasoline, crude oil and LPG.
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Product
Dynamic Vapor Sorption Analyzer
IGAsorp-CT
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The IGAsorp-CT is a fully automated dynamic vapor sorption analyzer for the measurement of water and organic solvent isotherms and kinetics on a wide range of materials. Operating at temperatures from 5 to 85 °C and humidity values from 0 to 98 %RH, the IGAsorp-CT offers the widest combined range of any DVS analyzer. An optional internal heater allows fully programmable pre-heating and thermal desorption measurements to 350 °C.
