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Product
EUV Lithography
NXE systems
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NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Dry Systems
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Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Product
Detectors
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Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Product
wavefront sensors
HASO EUV
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Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Product
Gratings for Synchrotron, FEL and EUV Light Sources
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HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Product
Scanning Electron Microscope
E5620
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The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Product
Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
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The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Product
Patterning Simulation
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KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Product
EUV Lithography
EXE systems
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EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Product
Immersion Systems
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Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Product
Semiconductor
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Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Product
EUV Lithography Systems
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Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Product
Ultraviolet Light Distribution Measurement Film
UVSCALE
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UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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Product
PCE-2000UV_1.5 Ultraviolet Light Radiation Measurement System
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Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV UV light source radiation Measurement system can realize the measurement of the relative spectral power distribution of ultraviolet LED, UV fluorescent lamp, UV light source, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and the total radiation flux in specific wavelength.
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Product
Ultraviolet Meter
UVR Series
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UVR series is suitable to manage lamp of ultraviolet curing equipment, Also suitable to measure intensity of ultraviolet ray for sun light and lamp.
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Product
Ultraviolet Analyzers
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Teledyne Analytical Instruments
Ultraviolet Analyzers by Teledyne Analytical Instruments
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Product
Economic Extreme Power Temperature Forcing System
ECO Cool
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ECO Cool® Economical Powerful - Thermal Forcing System.Exceptionally Powerful, Economical & Reliable
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Product
Extreme Environment Sensors
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For high pressure, low temperature, and high temperature applications* For applications requiring high accuracy, high reliability, and structural integrity.* Operating temperatures from -320°F to +1000°F (+1200°F short term).* Displacement systems withstand pressures up to 3500 or 5000 psi.* Dual-coil sensor design effectively minimizes radiation effects.* Hermetically sealed and laser welded.* Unaffected by environmental contaminants.
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Product
Cockpit Lighting
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Astronics works side by side with you to deliver customized lighted cockpit control panel assemblies and illuminated panels for your commercial, military, and business aviation programs.
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Product
Light Sources
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These external units provide illumination which is transmitted to the viewing instrument by a light guide cable, and then through the scope via the integral fiber bundle to the viewing tip.
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Product
Naval Lighting
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The Oxley naval lighting range offers high reliability for the most demanding environments with high sealing and the ability to meet the most stringent EMC standards. Where required, the lights are NVG friendly or NVG compatible to allow for multiple platform inter-operability with aircraft flying on night vision goggles. Oxley also produces explosion proof lighting designed specifically for battery or engine compartments.
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Product
Light Curtains
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Leuze electronic GmbH + Co. KG
Switching light curtains are perfect for monitoring large measurement fields. They react as soon as anything or anyone penetrates this field. Their fast configuration and simple handling save time and money compared to imaging processes. Thanks to different beam spacings and measurement field lengths, switching light curtains can be used to solve a range of application problems.
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Product
Light Meter
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Lumu Light Meter incorporate two state of the art sensors. True color sensor, based on the color standard CIE 1931/DIN 5033, and fast silicon photodiode capturing light at astonishing 750 000 measurements/second. Each Lumu Light Meter is calibrated before leaving the manufacturing line and comes with calibration certificate.
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Product
Deep Ultraviolet Observation System for Microscope
U-UVF248
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Model Capable of High-magnification/High-contrast Deep Ultraviolet (DUV) Observation. A Semiconductor / FPD Inspection Microscopes.
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Extreme Performance Edge Servers
Ark-7000 Series
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ARK-7000 series feature Intel Xeon processors and multiple expansion slots, delivering high-speed data transfer rates and enhanced remote management.
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Product
DC-AC Sine Wave Inverters for Ultraviolet (UV) Lamps
UV Lamp Inverters
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The sine wave inverters are designed and built to meet any customer input/output and mechanical configuration requirements.
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Product
Light Sources
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Excelitas offers an array of illumination and lighting technologies with custom design capabilities aligned with customer requirements to deliver an illumination solution optimized to your specifications. From simply supplying a discrete LED, Laser, Lamp or UVC source to providing a complete, integrated system, Excelitas consistently delivers lighting solutions for the most demanding applications.
