MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
Categories
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AD06A Baratron® Differential Pressure Sensor
AD06A Baratron® differential pressure sensors are single-ended dual-electrode/AC bridge devices that are extremely stable and designed to minimize the effect of temperature changes. Full Scale ranges are available from 25,000 Torr down to 0.1 Torr. Each range measures down to 1 part in 106 Full Scale with selected percent Reading accuracy limited by this resolution and with accuracies ranging from 0.25% to 0.05% of Reading. They are constructed of Inconel® and stainless steel, allowing use with many wet, dirty, or corrosive gases.
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Industrial Pressure Transducers
These industrial Baratron® capacitance manometers feature industrial enclosures and higher operating temperature ranges for industrial pressure measurement applications.
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Communication Gateways
We offer compact gateways for DeviceNet™, Profibus™ and Ethernet communication protocols available in RS232, RS422, RS485 and Modbus interfaces for communicating with our programmable automation controllers and networked I/O.
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Baratron® Isolation Systems
These Isolation Systems are designed to automatically maintain a heated Baratron® capacitance manometer at vacuum throughout a process cycle. Maintaining a heated Baratron® capacitance manometer at vacuum is one of the most important ways to optimize its accuracy and repeatability in production systems, making this product especially well-suited for fast-cycling industrial and semiconductor manufacturing processes.
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Dissolved Ammonia Delivery System
DI-NH3
MKS' DI-NH3 is a compact, stand-alone system providing dissolved ammonia water. With Semiconductor 3D IC architectures using new materials like Cu-Co and Si-SiGe, the ability to wet clean with precise alkaline chemistries is growing in frequency and importance. The DI-NH3 delivers dissolved ammonia, providing optimal cleaning capability in an alkaline chemistry, minimizing material loss and contamination and inhibiting Electrostatic Discharge (ESD). Using closed-loop control, conductivity and pressure are kept stable under changing flow conditions. The dissolved ammonia concentration is monitored and adjusted, delivering the specific NH4OH concentration needed. Dissolved ammonia’s alkaline chemistry provides ESD protection during rinsing, particle lift-off, and residual photoresist removal in middle-of-line (MOL) and prevents corrosion of cobalt/copper interfaces.
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Residual Gas Analyzers
Residual Gas Analyzers are an effective tool to analyze system gas loads resulting from real leaks, virtual leaks or chamber wall outgassing. RGAs have a number of advantages over traditional, dedicated gas leak detectors including the ability to differentiate between different gas species, comparable sensitivity levels, the ability to detect internal or "virtual" leaks and to detect and analyze outgassing problems.
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Advanced IR Gas Analyzer For Process Monitoring
T-Series
T-Series Inline Gas Analyzer improves gas measurement accuracy over the traditional non-dispersive infrared (NDIR) analyzers using Tunable Filter Spectroscopy (TFS™), a spectroscopic scanning technique capable of generating slices of spectra in the infrared region. Each scan produces an absorption spectrum which is used to identify compounds and provide concentration values. TFS technology improves gas identification accuracy and selectivity by subtracting out spectra from interferent gases within the same infrared regions. This spectral processing capability also provides multi-component measurement.
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Vapor Mass Flow Controllers
Heated pressure-based mass flow controllers are designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas.
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MultiGas™ TFS™ Gas Monitor For Multi-Compound Gas Analysis
The MultiGas™ TFS™ Monitor is an online, multi-compound, trace gas monitoring system in a stand-alone 19-inch rack enclosure. It uses an innovative tunable filter spectroscopy technology enabling high selectivity and stability measurement. Low detection limit (sub-ppm levels for most gases) is achieved through the use of high throughput optics coupled with a long-path gas cell and a high sensitivity detector.
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GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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Micro-Baratron® Pressure Transducers
Micro-Baratron® pressure transducers are ideally suited for use in delivery systems that feed ultrapure gases to critical process systems. Their wetted surfaces exposed to the gas stream have a finish of better than 5 µin Ra. These transducers exhibit superior dry-down characteristics, and contribute no particles above background.
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Vacuum Gauge Controllers
MKS offers a range of controllers that control ion gauges, heat-loss sensors, and thermocouples. Product features can be configured to meet your specific process needs. A variety of communication protocols, including RS-232, RS-485, and DeviceNet™, are available to speed and ease integration into your control scheme. In addition, many of the controllers provide local displays and a choice of set points that further simplify control system integration.
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DELTA™ IV 4-zone Flow Ratio Controller
DELTA™ IV 4-zone Flow Ratio Controller is a digital controlled, browser-enabled, process control instrument providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution for semiconductor, flat panel, and solar panel process uniformity and control. It is available in EtherCAT® or DeviceNet™ providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution.
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General Performance Absolute Pressure Switches
These absolute vacuum / pressure switches offer fast, accurate, and reliable protection for vacuum equipment and processes. Designed for applications where a DC signal output is not required, these pressure switches provide relay outputs that are readily interfaced with alarms, valve actuators, computers, process controllers, or other protection devices.
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Automation Controllers And Modules
Our complete automation platform solution along with a suite of automation control hardware and software configurable modules allow semiconductor and other industrial manufacturing customers to better automate their processes through computer-controlled automation and seamlessly integrate with existing MKS products to provide a complete solution.


















