MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
-
product
Dissolved Gas Systems
Dissolved gas in deionized water has been widely adopted in manufacturing processes in Electronics, Semiconductors, Flat Panel Displays and Solar applications. These wet techniques increase manufacturing productivity in particle lift-off and wet clean operations. Dissolved gases such as Ammonia, Carbon Dioxide and Ozone are environmentally friendly alternatives to heavy chemicals like sulfuric acid and peroxide acid solutions. MKS offers a large product line of Dissolved Gas systems that improve wet cleaning operations.
-
product
General Performance Pressure Transducers And Switches
These general performance Baratron® capacitance manometers are available as pressure transducers with an analog signal proportional to absolute or differential pressure, or as switches with relay outputs based on pressure.
-
product
Process And Chamber Monitoring Software & Systems
MKS process and monitoring solutions feature real-time, web-enabled, hardware, software, and systems to support a variety of tools and processes. These solutions improve performance and yield while reducing tool damage and false alarms.
-
product
Vacuum Pressure Transducers
MKS modular vacuum transducers feature compact size that dramatically reduces installation costs. These vacuum/pressure gauges are ideal for applications where controller size and local control are critically important. They are available as pressure transducers with an analog output, or as vacuum modules with digital communications used to transmit the pressure signal.
-
product
AD06A Baratron® Differential Pressure Sensor
AD06A Baratron® differential pressure sensors are single-ended dual-electrode/AC bridge devices that are extremely stable and designed to minimize the effect of temperature changes. Full Scale ranges are available from 25,000 Torr down to 0.1 Torr. Each range measures down to 1 part in 106 Full Scale with selected percent Reading accuracy limited by this resolution and with accuracies ranging from 0.25% to 0.05% of Reading. They are constructed of Inconel® and stainless steel, allowing use with many wet, dirty, or corrosive gases.
-
product
2 MHz RF Plasma Generators
NOVA® Series
The NOVA ; RF Plasma Generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
-
product
Vapor Mass Flow Controllers
Heated pressure-based mass flow controllers are designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas.
-
product
PRIME Ultra Clean, Ultra High Concentration, Ultra High Flow Ozone Generator
SEMOZON® AX8410
The SEMOZON® AX8410 PRIME is the initial product offering in MKS' next generation platform of compact, high concentration, high flow, ultra clean ozone generators. It features a newly designed cell and power structure to achieve twice the ozone output of earlier models with a similar footprint.
-
product
High Power Microwave Plasma Source
The High Power Microwave Plasma Source can be combined with a 6kW microwave generator for a high concentration of radicals providing a high productivity manufacturing solution. The High Power Microwave Plasma source is capable of igniting in multiple process gases, over a wide operating range with performance benefits in current and emerging applications such as, high throughput photoresist removal, advanced surface cleaning and conditioning, as well as, advanced deposition applications at the atomic level.
-
product
R*evolution® Remote Plasma Source
The innovative R*evolution® Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination. Self-contained and compact, R*evolution delivers up to 10 slm of oxygen radicals from a 6kW power supply with true power accuracy of <1% resulting in a high density, extremely clean radical source for photoresist strip and an optimal clean rate greater than 12 microns/min-1. R*evolution can be used for other surface preparation applications.
-
product
Compact Networked I/O
We offer networked I/O devices based on Ethernet, DeviceNet™, and Profibus for industrial control and automation applications.
-
product
Advanced IR Gas Analyzer For Process Monitoring
T-Series
T-Series Inline Gas Analyzer improves gas measurement accuracy over the traditional non-dispersive infrared (NDIR) analyzers using Tunable Filter Spectroscopy (TFS™), a spectroscopic scanning technique capable of generating slices of spectra in the infrared region. Each scan produces an absorption spectrum which is used to identify compounds and provide concentration values. TFS technology improves gas identification accuracy and selectivity by subtracting out spectra from interferent gases within the same infrared regions. This spectral processing capability also provides multi-component measurement.
-
product
Process Sense™ NDIR End Point Detector For Chamber Clean
The Process Sense endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). It gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.


















