MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
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Product
Atmospheric Pressure Gas Analyzers
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The Cirrus™ single-quadrupole mass spectrometers are powerful analytical tools for a wide range of laboratory and industry-based gas analysis applications. The Cirrus family, featuring the Cirrus™ 3 and Cirrus™ 3-XD atmospheric pressure gas monitoring systems are ideal for analysis of bulk gas, gas composition, and detection of trace gasses and contamination. These powerful, versatile and customizable platforms, when combined with Process Eye™ Professional software and its recipe-based control, can significantly boost your productivity.
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Product
DELTA™ III 3-zone Flow Ratio Controller
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The DELTA™ III Flow Ratio Controller divides and controls mixed process gas flows to three chambers or zones within a process chamber at proportions specified by the user to optimize process uniformity and repeatability. Available with EtherCAT® or DeviceNet™ communications, this device provides the latest in gas flow ratio measurement and control technology.
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Product
AD06A Baratron® Differential Pressure Sensor
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AD06A Baratron® differential pressure sensors are single-ended dual-electrode/AC bridge devices that are extremely stable and designed to minimize the effect of temperature changes. Full Scale ranges are available from 25,000 Torr down to 0.1 Torr. Each range measures down to 1 part in 106 Full Scale with selected percent Reading accuracy limited by this resolution and with accuracies ranging from 0.25% to 0.05% of Reading. They are constructed of Inconel® and stainless steel, allowing use with many wet, dirty, or corrosive gases.
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Product
Vacuum Pressure Transducers
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MKS modular vacuum transducers feature compact size that dramatically reduces installation costs. These vacuum/pressure gauges are ideal for applications where controller size and local control are critically important. They are available as pressure transducers with an analog output, or as vacuum modules with digital communications used to transmit the pressure signal.
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Product
Vacuum Process And Chamber Environment Monitors
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Our process monitors are innovative in-situ process monitoring instruments that are fully integrated, application-specific packages, including component residual gas analyzers (RGAs), analytical equipment, and control software. Process mass spectrometers are used in varied applications, including; Semiconductor, Thin Film (CVD, Etch, PVD and degas), pharmaceutical lyophylization and bulk gas purity monitoring.
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Product
Remote Plasma Sources For Process Applications
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MKS remote plasma sources deliver high density reactive radicals improving on-wafer cleaning and deposition throughput. Solutions consist of a fully integrated, self-contained unit designed for quick on-chamber installation providing fast, reliable plasma ignition of O2, Hydrogen and Nitrogen gases in a customer configurable package. All solutions are equipped with intelligent power control and EtherCAT® diagnostics supporting Industry 4.0.
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Product
Vapor Mass Flow Controllers
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Heated pressure-based mass flow controllers are designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas.
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Product
Precisive® 5 Application Specific Gas Analyzers
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The Precisive® Gas Analyzer is a real-time gas analyzer based on MKS' unique Tunable Filter Spectroscopy (TFS™) platform. The Precisive suite of products are calibrated for the measurement of a wide range of gases across multiple process industries. The real-time, continuous measurement capability provides immediate analysis ensuring control of critical process parameters.
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Product
High Temperature Absolute Pressure Transducers
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Our high temperature Baratron® capacitance manometers are controlled to temperatures of 150°C or higher for use use in demanding semiconductor manufacturing vacuum processes such as metal etching and nitride film chemical vapor deposition (CVD).
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Product
Automation Controllers And Modules
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Our complete automation platform solution along with a suite of automation control hardware and software configurable modules allow semiconductor and other industrial manufacturing customers to better automate their processes through computer-controlled automation and seamlessly integrate with existing MKS products to provide a complete solution.
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Product
Remote Plasma Sources
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Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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Product
Flow Ratio Controllers
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Optimizing process performance just became easier with the DELTA™ Flow Ratio Controller (FRC). Widely used in a variety of flow splitting applications such as etching, stripping, and PECVD, the DELTA™ Flow Ratio Controller (FRC) provides users with the ability to distribute gas or gas mixtures to different zones in a process chamber.
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Product
KEINOS™ 2 MHz 5 KW, 11 KW & 13 KW RF Plasma Generators
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The KEINOS™ 2MHz plasma generator builds on the solid, reliable attributes of the existing 2MHz design. KEINOS™ incorporates the latest technology from MKS to enable demanding applications of pulsing, fast impedance changes and shorter process steps. KEINOS™ can deliver up to 13kW of power, pulsing up to 50KHz, multiple set point pulsing, pulse shaping and MKS patented frequency tuning. KEINOS™ uses an integrated VI sensor for power accuracy and digital based control for fast response times.
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Product
Dissolved Ammonia Delivery System
DI-NH3
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MKS' DI-NH3 is a compact, stand-alone system providing dissolved ammonia water. With Semiconductor 3D IC architectures using new materials like Cu-Co and Si-SiGe, the ability to wet clean with precise alkaline chemistries is growing in frequency and importance. The DI-NH3 delivers dissolved ammonia, providing optimal cleaning capability in an alkaline chemistry, minimizing material loss and contamination and inhibiting Electrostatic Discharge (ESD). Using closed-loop control, conductivity and pressure are kept stable under changing flow conditions. The dissolved ammonia concentration is monitored and adjusted, delivering the specific NH4OH concentration needed. Dissolved ammonia’s alkaline chemistry provides ESD protection during rinsing, particle lift-off, and residual photoresist removal in middle-of-line (MOL) and prevents corrosion of cobalt/copper interfaces.
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Product
General Performance Absolute Pressure Switches
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These absolute vacuum / pressure switches offer fast, accurate, and reliable protection for vacuum equipment and processes. Designed for applications where a DC signal output is not required, these pressure switches provide relay outputs that are readily interfaced with alarms, valve actuators, computers, process controllers, or other protection devices.


















