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Inductively Coupled Plasma
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Inductively Coupled Plasma
Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Inductively Coupled Plasma Mass Spectrometer
ICPMS-2030
With its newly developed collision cell and optimized internal structure, the ICPMS-2030 provides superior sensitivity. At the same time, thanks to the adoption of its proprietary mini-torch unit and provision of an Eco mode, the quantity of argon gas needed for analyses has been greatly reduced to the industry's lowest levels. As a result, low running costs are assured. The Development Assistant function of the software automatically sets the optimal analysis conditions for quantitative analysis. Then, after measurements are complete, the Diagnosis Assistant function automatically checks the validity of the necessary data. While reducing the burden on the user, the efficiency of analyses is enhanced and the reliability of the data can be increased. It complies with FDA 21 CFR Part 11.
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Inductively Coupled Plasma Mass Spectrometer
An analytical technique that can be used to measure elements at trace levels in biological fluids.
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Inductively Coupled Plasma Emission Spectroscopy
Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Spectrometry
Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Inductively Coupled Plasma Optical Emission Spectr
An analytical technique used to determine how much of certain elements are in a sample.
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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ICP Plasma System
The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Chemical Analysis and Corrosion Testing
Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
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Inductively Coupled Plasma Spectroscopy (ICP-OES/MS), ICP Analysis Services
ICP-OES measures the light emitted at element-specific characteristic wavelengths from thermally excited analyte ions . This light emitted is separated and measured in a spectrometer, yielding an intensity measurement that can be converted to an elemental concentration by comparison with calibration standards. ICP-MS (ICP-Mass Spec) measures the masses of the element ions generated by the high temperature argon plasma. The ions created in the plasma are separated by their mass to charge ratios, enabling the identifcation and quantitation of unknown materials. ICP-MS offers extremely high sensitivity (i.e. low detection limits) for a wide range of elements
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Inductively Coupled Plasma Optical Emission Spectroscopy / ICP-OES Systems
Industry-leading performance, speed and ease of use – no compromises
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Inductive Switches
Leuze electronic GmbH + Co. KG
Inductive sensors are the industrial standard for the contactless detection of metallic objects.The Leuze product range includes a broad range of standard and special sensors which are available in many different designs and have been tried and tested millions of times by our customers.
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Remote Plasma Source
Xstream
The highly efficient Xstream® RPS dissociates large volumes of NF3 and quickly cleans chambers, improving your overall tool performance. Its plasma chamber showcases high-purity aluminum alloy and patented cooling capabilities. Built to last for years without repair or expensive chamber coatings, the Xstream RPS is the smart choice for dependability and efficient performance.
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Remote Plasma Sources
Equip your manufacturing and abatement processes with high functionality and exceptional reliability. Customize your chemistry. Expand your operating range. Deliver higher process rates. Advanced Energy’s remote plasma sources offer sophisticated options in streamlined designs.
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Plasma Profiling TOFMS
PP-TOFMS
Plasma Profiling TOFMS addresses the needs of materials scientists across a wide range of application areas. PP-TOFMS provides fast elemental depth distribution of any inorganic material. The speed and ease of use of PP-TOFMS permit to reduce optimization time of growth processes as many research scientists strive to reduce the time from discovery to applications of new materials.The simultaneous full coverage of TOFMS available for each point of depth permits the detection of non suspected contamination. This is key for failure analysis and optimization of thin film processes that tend to no longer be based on ultra-high grade methods (i.e. ink jet printing…).
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Inductive Sensors
Inductive Proximity Switches, self contained, depend on the output of an oscillator for their operation. The oscillator resonant circuit uses an open core coil to produce a concentrated high frequency electromagnetic (RF) field, which emerges from the active surface of the sensor. If a metal target (or other electrically conductive material) enters this field, eddy currents will be induced in it, causing the resonating oscillator to be damped.
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Inductive Sensors
Our hygienic sensors are extremely durable against abrasive and aggressive media: their labeling is resistant to abrasion and chemicals. The luminous displays are protected against destruction and the housing construction is optimized for safe cleaning.
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RF Plasma Generators & Amplifiers
100 W to 2400 W 13.56 MHz Analog/Digital, RS-232, USB interfaces Low Harmonic Distortion Automatic and Manual Gain Control High Speed Pulsing (Bursting) controls Compatible with T&C''''s Matching Networks GUI Software (complete PC control) Includes all essential RF power/communication cables and mounting brackets Air cooled (Air & Water 1200 W +) Half rack mount or stand alone versions Ideal for: Industrial, Scientific, and Medical Applications
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Inductive Pick-up Timing Light
150
This hard working timing light is accurate up to 8,000 RPM. An extremely bright flash will help you time the engine. The break and shock resistant plastic housing, reduces damage from accidental drops.
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Coupling Decoupling Network
TBCDN-M2
The TBCDN-M2 is a Coupling Decoupling Network for conducted immunity testing according to IEC 61000-4-6.
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HV Coupling Capacitors
Our high-voltage coupling capacitors are a main component of our partial discharge test stations. They serve to decouple the partial discharge impulses and act as a voltage divider, the output voltage of which is matched to our partial discharge measuring devices (with integrated voltage measurement) and peak voltage measuring devices. These high-voltage components are also available separately in their various designs, sizes, capacities and voltage ranges.
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Coupling Decoupling Network
TBCDN-M3
The TBCDN-M3 is a Coupling Decoupling Network for conducted immunity testing according to IEC 61000-4-6.
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Unclamped Inductive Load Tester
ITC55100C
The system has been designed around a very powerful micro-controller that gives it a timing resolution of 40ns, twenty times faster than the previous model. Its response time to the peak and zero current is improved ten times. Combined this gives greater accuracy for the charging and avalanche times and for the reported peak drain current.
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Remote Plasma Sources
Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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Inductive Coupler
CLAMPMITTER™
The CLAMPMITTER™ is a unique tool for inductive coupling. This self-contained inductive transmitter increases productivity, promotes safety and simplifies locates by condensing the transmitter and inductive coupler into one cordless package. Whether climbing down a manhole or accessing a utility box, the Clampmitter is an easy alternative to suiting up with a full transmitter and wired coupler.
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Inductive Load Banks
L-Series
L-series inductive load banks are devices which contain inductive loads, apply the load to an electrical power source and dissipate the reactive power of the electrical source. L-series load banks are designed for portable and fixed applications. Hilkar brand L-series load banks have robust design and are specifically designed for corrosive environments. Load banks can be controlled via local, remote, wireless remote or automatic control systems.
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Inductive Heater
BD-1.01
The device is assigned to heat the bars to the state, which allows upsetting. The DB-1.01 heater characterizes especially high watt-hour efficiency (bigger than 98%) thanks to suitable concentration of electromagnetic field in the heating zone of inductor (the solution secured by patent). It is possible to addapt the nductive heater BD-1.01 for heating any others bars.
