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Tabletop Front & Backside Mask Aligner
Model 200IR
The OAI Model 200IR Mask Aligner is a tabletop system that requires minimal clean room space. It is a cost-effective alternative for R&D or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The Model 200IR Mask Aligner is capable of one micron resolution and alignment precision. It has an alignment module which features mask insert sets and quick-change wafer chucks that enable the use of a variety of substrates and masks without requiring tools for reconfiguration. The alignment module incorporates micrometers for X, Y, and z-axis.
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Tabletop Mask Aligner
Model 200
The OAI Model 200 Mask Aligner is a cost-effective high performance mask Aligner that has been engineered with industry proven components that have made OAI a leader in the photolithography capital equipment industry. The Model 200 is a tableop mask Aligner that requires minimal cleanroom space. It offers an economic alternative for R&D, or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The system is capable of one micron resolution and alignment precision.
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Large Substrate Mask Aligner
Model 6020
The Model 6020 is a large substrate Production Mask Aligner or Auto-flood Exposure System for RDL First Level Advanced Packaging (PLP) and markets requiring exposure of large glass panels. It is engineered with OAI’s precision, reliability, and quality that is found in all of OAI’s products. The features include wedge effect leveling, superb process repeatability, ≤ 2.0µm printing resolution, and remote diagnostics. Using robotic handling, the system can stand alone or be fully integrated with photo resist processing.
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Automated Front & Backside Mask Aligner System
Model 6000
With over 4 decades of manufacturing in the semiconductor industry, OAI meets the growing challenge of a dynamic market with an elite class of production photolithography equipment. Built on the proven OAI modular platform, the Model 6000 has front and backside alignment that is fully automated with a submicron printing capability as well as submicron top to bottom front side alignment accuracy which delivers performance that is unmatched at any price. Choose either topside or optional backside alignment which uses OAI’s customized advanced recognition pattern software. These Mask Aligners have OAI’s Advanced Beam Optics with better than ±3% uniformity and a throughput of 200 wafers per hour in first mask mode, which results in higher yields. The Series 6000 can handle a wide variety of wafers from thick and bonded substrates (up to 7000 microns), warped wafers (up to 7 mm-10mm), thin substrates (down to 100 micron thick), and thick photo resist.
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Mask Testing Instrument(N95,KN95,Disposable Mask)
Sanwood Environmental Chambers Co ., Ltd.
Is used to test the filtration level of aerosol particles by respirator filter element under certain environmental conditions.
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PHOTO COUPLER TESTER
May be linked to machine handler for automatic test on production line.Test items include：VF、IR、Vceo、Iceo、Vsat、CTR
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Photo Detector Laser Power Meters
11PD100-Si
Silicon detectors provide a generous aperture for laser beams up to 10 mm in diameter. The threaded aperture allows you to install filters, attenuators, fiber optic adapters or other optics that suit your specific needs.
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Bounded Output Mask
The bounded output mask provides a means of ensuring that measurements of TI according to IEC 62359 can satisfy the requirement of only determining the ultrasonic output through an area of 1 cm x 1 cm.
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Automated Mask Aligner with Integrated Mask Changer
Model 6000A-MC
The Model 6000A-MC is a precision system combining OAI’s Model 6000, Automated Production Mask Aligner, with an integrated mask changer. The mask changer can handle from 10 to 150 masks. Ideal for both semiconductor and bio-tech applications. It also is designed with a bar code reader to assure each mask is coordinated to the right process. Please contact OAI for further product information.
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Phase Masks
Phase masks are the production tool used to write gratings in fibers and waveguides. Ibsen Phase masks incorporate unbeatable, interferometric (holographic) patterning technology into a production friendly Phase mask.
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Masks Flame Retardant Performance Tester
WKS-1208
WKS-1208 Masks Flame Retardant Performance Tester is used to test the burning performance of the mask after contacting the flame at a certain linear velocity. It is special test instrument for the flame retardant performance of masks.
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Traffic Photo Enforcement
LidarCam 2
Automatically collect a video + multiple high-resolution photos every time you capture a traffic violation. Built-in Automated License Plate Recognition (ANPR/ALPR) Technology can automatically check for wanted plates or other violations. Hand-held or mounted to a tripod, in a patrol vehicle or from the side of the road, the Stalker LidarCam 2 is the next generation of photo enforcement.
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Photo Gate Logger Sensor
NUL-209
This sensor can be used to study various kinds of motion. With six modes of operation, time, velocity or acceleration can be measured with one or two photo gates and associated timing cards, as well as showing pictorially the status (digital 1 or 0) of the voltage output of the photo gate as timing cards pass through it.
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Photo Detector with Integrated Transimpedance Amplifiers
ADN3010-11
Analog Devices optoelectronic amplifiers include a range of germanium photodiodes that, through a proprietary process, have been monolithically integrated with silicon transimpedance amplifiers and limiting amplifiers. This process eliminates the need for bond wires connecting the photodiode to the transimpedance amplifier, which leads to improved performance and greater manufacturing reliability. Our portfolio of products also supports the growing need for optical and electrical interface miniaturization.
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GENERAL INSPECTION MACHINE AFTER SOLDER MASK
DVI is a technology of automated optical inspection, which can inspect deep to the difference from semi-transparent layers or semi-reflective layers.
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Medical Masks Flammability Tester
TF361
TESTEX Testing Equipment Systems Ltd.
Medical Masks Flammability Tester is used to test the flammability of medical masks, to ensure the safety of masks to wear in. Medical Masks Flammability test Chamber complies with EN 149, GB 2626, GB 19083.
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Photo Optic Sensors
From patient monitoring in hospitals, to wearables and home healthcare applications, TE Connectivity (TE) offers photo optic sensors and components for non-invasively measuring blood oxygenation (SpO₂) level. With more than 27 years of proven reliability and expertise, TE has designed SpO2 sensors with best-in-class flexibility to accommodate multiple wavelength options. Our ability to provide both components and complete sensor packages make us the leading choice for pulse oximetry applications that require high degrees of precision, durability and performance.
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Reticle / Mask Particle Detection System
PR-PD2HR
In semiconductor plants, where high performance and demanding functionality are required, the HORIBA PD Series'' high operating rate and long-term dependability have earned it a solid reputation. Inheriting a transfer system that has proven to provide stable, high performance and superior throughput over long operating periods, the PR-PD2HR now offers the most sensitive detection in the series with exclusive signal processing that can detect particles as small as 0.35 m.
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Photo Detector Testing
With the rise of 5G technology and popularization mobile devices, more and more advanced photoelectric sensors are used in our daily lives. In order to be better applied to mobile devices, the photosensitive area of these advanced photodetector is getting smaller and smaller. However, these applications place higher and higher requirements on the light sensing performance of advanced photodetectors. In the process of shrinking the photosensitive area, it also brings the challenge of accurate measurement of quantum efficiency. Enlitech adopts the spatial light homogenizing technology and follows the ASTM standard “Irradiance Mode” test method, which is proven that it can accurately perform quantum efficiency and other key parameter measurements of advanced photodetectors.
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Masks Respiratory Resistance Tester
WKS-1200
WKS-1200 Masks Respiratory Resistance Tester applies to determining the inhalation resistance and exhalation resistance of respirators and mask protective products under specified conditions, and used for the relevant testing and inspection of ordinary mask products by the national labor protection equipment inspection agency or manufacturer.
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Mask ventilation resistance and pressure differential tester
WKS-3102
Mask ventilation resistance and pressure differential tester is used to measure the inhalation and exhalation resistance of mask under specified conditions. Applicable to mask manufacturers, labor protection equipment inspection agencies to carry out related testing and inspection of mask products, mask breath resistance tester, breathing valve air tightness tester, breath resistance machine for measuring respirator and mask protection products in Inspiratory resistance and expiratory resistance under specified conditions.
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Medical Face Masks Flammability Tester
Sataton Instruments Technology CO., Ltd
Medical face masks flammability tester is to determine the fire resistance performance of medical face masks and full face masks. The tester can provide a specific flame and make the dummy head with facepiece move to the flame under a specific speed. The operator can observe the effects of the flame on the masks and facepiece. The tester is suitable for medical face mask, respiratory protective equipment and full face masks.
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Mask Produce and Test Machine
LISUN produce the bfe tester for face mask, pfe tester, melt-blown cloth electrostatic electret generator according to ASTM F1862-17, ASTM F2299-03 (2017), ASTM F2100-2019, BS EN14683-2019, BS EN 14387-2004+A1 2008, BS EN 136-1998, BS EN 140-1999, BS EN 143-2000 +C1-A1, BS EN 149-2001+A1
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MASK MVM-SEM® E3600 Series
E3640
Ongoing semiconductor process shrinks are driving new demand for stable, highly precise measurement of pattern dimensions for photomask and wafer production. The E3640 satisfies these requirements with industry-leading precision measurement capabilities and upgraded functionality that enhances mask R&D and production efficiency.
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NanoLattice Pitch Standard for Mask Handling Tools (NLSM)
The NanoLattice™ (NLSM) 100 nm pitch standard utilizes gratings with near perfect periodicity to calibrate magnification and scan linearity of CD-SEM and Atomic Force Microscopes (AFM). Make the grade, with the only pitch standard of its kind available below the 130 nm node.
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Camera Color Correction for Photo & Video
SpyderCHECKR™ Family
Automatically color correct your images by capturing SpyderCHECKR reference patches in your photo shoot, eliminating trial and error in post production. You can also color calibrate your camera and perform precision in-camera white balance.
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Custom Solutions for Mask Aligners
OAI offers custom designed solutions built to your unique specification.
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Mask Treatment Process
Model 100MT
OAI offers a unique process which extends the life of your mask, says good bye to tedious washing and drying of mask and thus enables your mask aligner to have increased productivity at the lowest cost of ownership. The Model 100 MT is a 2 step process.
