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EUV Lithography
EXE systems
EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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EUV Lithography Systems
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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EUV Lithography
NXE systems
NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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wavefront sensors
HASO EUV
Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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X-Ray Cameras for Soft X-Ray, VUV, and EUV Applications
SOPHIA® XO
Teledyne Princeton Instruments
SOPHIA® XO offers high-sensitivity (>95% QE) and high-speed for the widest range of VUV and x-ray detection, with thermoelectric cooling up to -90℃ and high frame rates. With a rotatable, industry-standard CF flange and high-vacuum seal design the software-selectable gains and readout speeds make this camera well suited for UHV applications.
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Detectors
Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Gratings for Synchrotron, FEL and EUV Light Sources
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Immersion Systems
Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Dry Systems
Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Ultraviolet Analyzers
Teledyne Analytical Instruments
Ultraviolet Analyzers by Teledyne Analytical Instruments
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Ultraviolet Light Distribution Measurement Film
UVSCALE
UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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Ultraviolet Meter
UVR Series
UVR series is suitable to manage lamp of ultraviolet curing equipment, Also suitable to measure intensity of ultraviolet ray for sun light and lamp.
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Extreme Temperature Passive Probe
N7007A
Many environmental test engineers today are using standard-temperature probes in extreme temperature condition, which causes physical damage to the probe. Another common practice among environmental test engineers is to simply attach long wires at the end of their probes, which significantly degrades measurement performance due to excessive inductance and reduced bandwidth. Keysight addresses this issue with the N7007A single-end passive probe.
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Light Monitor
LM-101
The LM-101 Light Monitor system provides an efficient and cost effective solution for monitoring coating thickness in real time. It consists of the LM-101 Light Monitor, LM-101A/AS light source, and Detector assembly.
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Light Measurement
Redesigned light sensors optimized for ecological, meteorological, solar energy, plant research, and underwater measurements.
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Light Simulator
From the review of the scientific development history, reliable and stable artificial light sources have played a very important role in the past century. For example, the artificial solar simulator is an important part of simulating sunlight to ensure accurate performance of PV characterization. With the growth of light sensor applications, more and more requirement of light simulators (or artificial light sources) explored. One of the core technologies of Enlitech is the artificial light sources. We can manipulate different lamp types (short arc lamps, LEDs, filament lamps et. al.) to generate different spectrum-form in different light intensity levels, beam sizes, and wavelength ranges. We have launched different artificial light source products for different applications fields. For instance, SS-X series solar simulators and ILS-30 ambient light simulator are for the PV field, HAAS is highly accurate star light simulator for the space field, and ALS-300 is a general-purpose light source in science research field. These products can not only meet the needs of your application, but also speed up the process of your research or mass-production.
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Light Meters
An instrument for measuring the intensity of light, used chiefly to show the correct exposure when taking a photograph.
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Light Source
LS-BA
Balance Light Source (LS-BA) is designed for transmittance and absorbance measurement with color information. Halogen Light source provides the stable and smooth wide-band spectral output. It’s proper for most visible to near infrared range measurement. The efficiency of blue region will be enhanced by extra two blue LEDs.
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Light Meter
Lumu Light Meter incorporate two state of the art sensors. True color sensor, based on the color standard CIE 1931/DIN 5033, and fast silicon photodiode capturing light at astonishing 750 000 measurements/second. Each Lumu Light Meter is calibrated before leaving the manufacturing line and comes with calibration certificate.
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Light Source
UVF-205S
By use of the light guide with the quartz sensor fiber, feed-back control and monitoring of UV irradiation intensity is possible. Also setting of UV intensity and meaurement by personal computer is possible
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PCE-2000UV_1.5 Ultraviolet Light Radiation Measurement System
Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV UV light source radiation Measurement system can realize the measurement of the relative spectral power distribution of ultraviolet LED, UV fluorescent lamp, UV light source, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and the total radiation flux in specific wavelength.
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Light Meter
Shenzhen UYIGAO Electronic Technology Co., Ltd
Digital Luxmeter Lux light meter for photography Photometer Mini spectrometer spectrophotometer Luminometer
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Light Sources
These external units provide illumination which is transmitted to the viewing instrument by a light guide cable, and then through the scope via the integral fiber bundle to the viewing tip.
