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Product
Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
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The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Product
wavefront sensors
HASO EUV
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Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Product
Semiconductor
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Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Product
EUV Lithography
EXE systems
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EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Product
Gratings for Synchrotron, FEL and EUV Light Sources
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HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Product
EUV Lithography Systems
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Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Product
EUV Lithography
NXE systems
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NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Product
Scanning Electron Microscope
E5620
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The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Product
Detectors
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Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Product
Immersion Systems
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Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Product
Patterning Simulation
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KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Dry Systems
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Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Product
Ultraviolet Analyzers
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Teledyne Analytical Instruments
Ultraviolet Analyzers by Teledyne Analytical Instruments
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Product
Ultraviolet Meter
UVR Series
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UVR series is suitable to manage lamp of ultraviolet curing equipment, Also suitable to measure intensity of ultraviolet ray for sun light and lamp.
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Product
Deep Ultraviolet Observation System for Microscope
U-UVF248
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Model Capable of High-magnification/High-contrast Deep Ultraviolet (DUV) Observation. A Semiconductor / FPD Inspection Microscopes.
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Product
Solar Ultraviolet Pyranometers
UVR1-T, UVR1-A, &
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The Middleton Solar UVR1 series are precision filter radiometers for measuring solar global ultraviolet irradiance. The UVR1-T and UVR1-A are suitable for air pollution monitoring. The UVR1-B is suitable for biological and human erythema (sunburn) monitoring.
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Product
PCE-2000UV_1.5 Ultraviolet Light Radiation Measurement System
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Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV UV light source radiation Measurement system can realize the measurement of the relative spectral power distribution of ultraviolet LED, UV fluorescent lamp, UV light source, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and the total radiation flux in specific wavelength.
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Product
Light Source
UVM-SP-JW
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Readouts of UV intensity and cumulative luminescence count are prompted either on the front panel or via the externally connected remote signal control. The UV intensity detection segment is intended to measure a specific intensity of light signals, while the cumulative luminescence count is designed to tally a cumulative count on all UV intensities measured, in conjunction with real-time calibration.
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Product
Light Sources
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The unique dual-output of equivalent beams make it a useful source for many comparative applications in addition to wavelength calibration and so on. The two output beams originate from two views of the single emitting spot where the electron beam from the single hairpin filament collides with the interchangeable anode.
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Product
Light Transmitter
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Measure Range: Range 1: 0-2,000 LuxRange 2: 2,000-20,000 LuxRange 3: 20,000-50,000 LuxOutput: 4-20 mARange 1: 1,000 Lux = 12mA2,000 Lux = 20 mARange 2: 2,000 Lux = 5.6mA20,000 Lux = 20mARange 3: 20,000 Lux = 10.4 mA50,000 Lux = 20 mA90 - 260 ACV50 Hz/60 Hz
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Product
Light Measurement
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Redesigned light sensors optimized for ecological, meteorological, solar energy, plant research, and underwater measurements.
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Product
Light Monitor
LM-101
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The LM-101 Light Monitor system provides an efficient and cost effective solution for monitoring coating thickness in real time. It consists of the LM-101 Light Monitor, LM-101A/AS light source, and Detector assembly.
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Product
Lighting Reliability
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LED/OLED package lifetime is highly dependent on thermal management, and LED lamp performance can be dependent on the luminaire in which it is installed. Lighting reliability test system for LED/OLED Products are widely used for normal /accelerated aging, lumen maintenance measuring, lifetime evaluation and temperature characteristic testing for LED/OLED products including LED package, array, module, OLED module and luminaires.
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Product
Vehicle Lighting
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The lights are designed for both the retrofit and new build market and include normal visible, NVG Compatible, NVG Friendly and Covert technology. Solutions include infra-red (IR) external lights and low profile interior cabin lighting and task lighting.
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Product
Light Sources
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Bentham's range of light sources has evolved to suit the requirements of our systems and their users and now offers single or multiple sources from 200nm to 40m:
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Product
Light Sources
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These external units provide illumination which is transmitted to the viewing instrument by a light guide cable, and then through the scope via the integral fiber bundle to the viewing tip.
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Product
Light Meter
2330 LX
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Standard Electric Works Co., Ltd
Wide range for measurements up 40000 lux and 4000 fc.. 0.01 lux and 0.001 fc resolution for accurate low light level measurements. Light sensor cover is included for preserving sensor life. Auto off function. Data hold function. Low battery indication. Over range indication. Auto-ranged. Manual-ranged. Calibration mode is provided. 9V battery system. Selection key for lux and fc. The spectral sensitivity close to CIE photopic curve. Ideal tool for workplace, clean-room and computer room light testing. Video, photographic, office, classroom, and architectural uses.
