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Product
wavefront sensors
HASO EUV
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Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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EUV Lithography
NXE systems
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NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Product
Immersion Systems
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Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Product
Scanning Electron Microscope
E5620
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The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Dry Systems
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Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Product
Gratings for Synchrotron, FEL and EUV Light Sources
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HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Product
EUV Lithography Systems
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Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Product
Detectors
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Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Product
Semiconductor
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Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Product
EUV Lithography
EXE systems
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EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Product
Patterning Simulation
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KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Product
Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
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The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Product
Ultraviolet Meter
UVR Series
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UVR series is suitable to manage lamp of ultraviolet curing equipment, Also suitable to measure intensity of ultraviolet ray for sun light and lamp.
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Product
Extreme Temperature Passive Probe
N7007A
Oscilloscope Probe
Many environmental test engineers today are using standard-temperature probes in extreme temperature condition, which causes physical damage to the probe. Another common practice among environmental test engineers is to simply attach long wires at the end of their probes, which significantly degrades measurement performance due to excessive inductance and reduced bandwidth. Keysight addresses this issue with the N7007A single-end passive probe.
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Product
Ultraviolet Light Distribution Measurement Film
UVSCALE
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UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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Product
PCE-2000UV_1.5 Ultraviolet Light Radiation Measurement System
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Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV UV light source radiation Measurement system can realize the measurement of the relative spectral power distribution of ultraviolet LED, UV fluorescent lamp, UV light source, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and the total radiation flux in specific wavelength.
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Product
Lighting Reliability
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LED/OLED package lifetime is highly dependent on thermal management, and LED lamp performance can be dependent on the luminaire in which it is installed. Lighting reliability test system for LED/OLED Products are widely used for normal /accelerated aging, lumen maintenance measuring, lifetime evaluation and temperature characteristic testing for LED/OLED products including LED package, array, module, OLED module and luminaires.
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Product
Light Source
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OrienTek Optical Technology Ltd.
High Precision● Highly accurate unit offering 6 calibrated wavelengths● Interchangeable connectors● Durable and reliable design● Easy-to-use interface forerror-free testing● Rubber armor protection
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Product
Light Sources
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Bentham's range of light sources has evolved to suit the requirements of our systems and their users and now offers single or multiple sources from 200nm to 40m:
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Product
Lighting Maintenance
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Lumen maintenance is the most useful gauge to determine the lifetime or useful light output rating of an LED light source.
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Product
Light Simulator
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From the review of the scientific development history, reliable and stable artificial light sources have played a very important role in the past century. For example, the artificial solar simulator is an important part of simulating sunlight to ensure accurate performance of PV characterization. With the growth of light sensor applications, more and more requirement of light simulators (or artificial light sources) explored. One of the core technologies of Enlitech is the artificial light sources. We can manipulate different lamp types (short arc lamps, LEDs, filament lamps et. al.) to generate different spectrum-form in different light intensity levels, beam sizes, and wavelength ranges. We have launched different artificial light source products for different applications fields. For instance, SS-X series solar simulators and ILS-30 ambient light simulator are for the PV field, HAAS is highly accurate star light simulator for the space field, and ALS-300 is a general-purpose light source in science research field. These products can not only meet the needs of your application, but also speed up the process of your research or mass-production.
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Product
Light Monitor
LM-101
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The LM-101 Light Monitor system provides an efficient and cost effective solution for monitoring coating thickness in real time. It consists of the LM-101 Light Monitor, LM-101A/AS light source, and Detector assembly.
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Product
Light Booths
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Konica Minolta Sensing Americas, Inc
Konica Minolta’s Light Booth products provide accurate results when inspecting a range of unique products including inks, paints, plastics, textiles, paper and colorants. Light booths simulate lighting conditions which allows testing in a multitude of different lighting conditions. This allows for incredibly precise color measurements in a spectrum of different lights and angles.
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Light Meters
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Light Meters are used to measure the light output of an illumination source for a number of optical applications. Light Meters are measurement devices that feature photodiodes to determine the level of light transmitted from a source. Light Meters possess simple, easy to read screens upon which measurements are displayed in one or more photometric units. Most Light Meters possess traceable NIST certification for proof of accuracy.
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Product
Ultraviolet Microscope
UVM-1
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The UVM-1™ is a UV microscope that also can image in the visible and NIR. This UV-visible-NIR microscope embodies both advanced optics for cutting edge UV, color and NIR imaging and visualization. The system is a flexible design, very easy to use and very durable. It is designed with cutting edge CRAIC optics for the highest image quality and to give years of service.
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Cameras and Lights
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MacArtney LUXUS cameras and lights are designed to combine operational and service flexibility, excellent performance and reliability.
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Vehicle Lighting
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The lights are designed for both the retrofit and new build market and include normal visible, NVG Compatible, NVG Friendly and Covert technology. Solutions include infra-red (IR) external lights and low profile interior cabin lighting and task lighting.
