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Product
EUV Lithography
NXE systems
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NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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wavefront sensors
HASO EUV
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Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Product
Dry Systems
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Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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EUV Lithography Systems
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Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Product
Semiconductor
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Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Product
Detectors
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Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Product
Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
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The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Product
Gratings for Synchrotron, FEL and EUV Light Sources
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HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Product
EUV Lithography
EXE systems
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EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Product
Patterning Simulation
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KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Product
Immersion Systems
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Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Product
Scanning Electron Microscope
E5620
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The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Product
PCE-2000UV_1.5 Ultraviolet Light Radiation Measurement System
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Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV UV light source radiation Measurement system can realize the measurement of the relative spectral power distribution of ultraviolet LED, UV fluorescent lamp, UV light source, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and the total radiation flux in specific wavelength.
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Product
Ultraviolet Checker
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For magnetic particle testing. Intensity of ultraviolet can be read directly in mw/c directly.
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Product
Ultraviolet Meter
UVR Series
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UVR series is suitable to manage lamp of ultraviolet curing equipment, Also suitable to measure intensity of ultraviolet ray for sun light and lamp.
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Product
Ultraviolet Analyzers
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Teledyne Analytical Instruments
Ultraviolet Analyzers by Teledyne Analytical Instruments
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Product
Solar Ultraviolet Pyranometers
UVR1-T, UVR1-A, &
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The Middleton Solar UVR1 series are precision filter radiometers for measuring solar global ultraviolet irradiance. The UVR1-T and UVR1-A are suitable for air pollution monitoring. The UVR1-B is suitable for biological and human erythema (sunburn) monitoring.
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Product
Data Logger for Extremely Low Temperature
DSR-ELT
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Special probe using military industrial technology supports measuring temperature ultra low to -196 Original fittings for sensor connection, ensures 100,000 plugs Support single DSR connecting to PC via USB interface, and multiple DSR grouped in RS485 or LAN networking for central management Suitable for medical refrigerator, biological specimens preservation, scientific research and other applications
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Product
"Extremely Random" Precision Noise Generator
Model 3025
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The Model 3025, "Extremely Random"TM Precision Noise Generator supplies White and Pink Noise, and a 1 kHz reference signal. Crystal controlled - the pseudo random circuitry provides a 6.5 Day pseudo-random cycle time, assuring a "Extremely Random"TM noise source.
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Product
Light
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Welcome to Thorlabs; below you will find links to light emitters, sources, and controllers, a subset of our entire line of photonics products. Our light sources are conveniently separated into coherent and incoherent sources. The coherent source category includes laser diodes, laser diode modules, tunable lasers, HeNe lasers, and femtosecond lasers, while the incoherent source link brings you to a selection of LEDs, white light, and broadband SLD sources. The Quantum Electronics category includes optical amplifiers, modulators, and gain elements that are frequently used in research and OEM applications. All of our light sources and optical amplifiers are supported by an extensive line of mounts, sockets, TEC controllers, and current controllers.
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Product
PCE-2000UV Ultraviolet LED/Module Radiation Measurement System
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Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV Ultraviolet LED/Module Radiation Measurement System can realize the measurement of the relative spectral power distribution of ultraviolet LED, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and total radiation flux in specific wavelength.
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Light Sources
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Fiber optic light sources are a low-cost way to analyze and identify accurate fiber optic readings, while certifying optical fiber. Receive the ability to measure fiber optic light continuity, loss, and quality of the signal.
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Product
Extreme Performance AI NVIDIA Rugged Computer
JetSys-5320
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Jetsys-5320 drives critical AI applications at the edge with a rugged small form factor enclosure. A server-class AI processing system based on the NVIDIA® Jetson™ TX2i SOM, along with a dual-core Denver 2 64-bit CPU and quad-core ARM A57 complex.
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Product
Light Meters
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Using a light meter you can track light levels anywhere and with a fast, stable and accurate sampling result.The result can be seen in a large digital LCD display.
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Product
Naval Lighting
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The Oxley naval lighting range offers high reliability for the most demanding environments with high sealing and the ability to meet the most stringent EMC standards. Where required, the lights are NVG friendly or NVG compatible to allow for multiple platform inter-operability with aircraft flying on night vision goggles. Oxley also produces explosion proof lighting designed specifically for battery or engine compartments.
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Product
Light Meters
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TES Electrical Electronic Corp.
Dual Display, 4 digit LCD reading.Spectral Sensitivity close to CIE phototropic curve.Measuring levels ranging 0.001 to 1999kAccurate and instant response. Luminance ratio A/B
