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Product
Scanning Electron Microscope
E5620
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The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Product
EUV Lithography
NXE systems
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NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Product
wavefront sensors
HASO EUV
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Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Product
Gratings for Synchrotron, FEL and EUV Light Sources
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HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Product
Patterning Simulation
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KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Product
Detectors
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Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Product
EUV Lithography
EXE systems
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EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Product
Semiconductor
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Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Product
Immersion Systems
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Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Product
Dry Systems
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Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Product
Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
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The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Product
Ultraviolet Light Distribution Measurement Film
UVSCALE
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UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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Product
PCE-2000UV_1.5 Ultraviolet Light Radiation Measurement System
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Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV UV light source radiation Measurement system can realize the measurement of the relative spectral power distribution of ultraviolet LED, UV fluorescent lamp, UV light source, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and the total radiation flux in specific wavelength.
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Product
Extreme Performance Edge Servers
Ark-7000 Series
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ARK-7000 series feature Intel Xeon processors and multiple expansion slots, delivering high-speed data transfer rates and enhanced remote management.
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Product
Deep Ultraviolet Spectrophotometer System
VUVAS-10X
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A new ultraviolet spectrophotometer system for optical metrology just arrived at NASA Goddard! The VUVAS-10X spectrophotometer works best in the 90 to 160 nanometer wavelength range, also known as deep or vacuum ultraviolet (VUV) region. It uses a windowless hydrogen plasma light source and differential pump section to reach many wavelengths beyond those of conventional deuterium lamps. The source also works with other gases, or gas mixtures, for atomic spectral line emission from about 30 nanometers (double ionized Helium gas) up to the Visible light range. The new spectrophotometer system, McPherson VUVAS-10X, uses a one-meter focal length high-resolution monochromator with the special light source, scintillated detector and Model 121 goniometric sample chamber. The system is ideal for optical transmission, absorbance and specular reflectance at incident angles up to 60 degrees. This McPherson spectrophotometer system will help develop, inspect and qualify optical materials and coatings used for very high altitude and extraterrestrial space flight missions.
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Product
Serial FPDP Extreme 1/2 ATR Recorder
Talon RTX 2596
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- Rugged 1/2 ATR MIL-spec chassis for harsh mechanical and thermal environments- Environmentally sealed, conduction-cooled- Fully sealed for RF emissions with EMI power line filter- MIL-STD circular connectors- Compact and lightweight design - 18 lb (8 kg)- QuickPac® drive packs allow quick removal of all data storage up to 61 TB via the front panel- Ideal for UAVs, military vehicles, aircraft pods and outdoor environments- Four-channel Serial FPDP record/playback- Supports Flow Control, CRC, and Copy/Loop Mode as a receiver and transmitter- Supports 1.0625, 2.125, 2.5, 3.125 and 4.25 GBaud link rates- Single-mode and multi-mode fiber interfaces available- Sustained real-time record rates up to 4 GB/s- 12 to 28 VDC power supply- Optional GPS receiver for precise time and position stamping- SystemFlow API, GUI and Signal Viewer analysis tools- Optional telnet remote connection to recorder
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Product
Extreme Environment Sensors
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For high pressure, low temperature, and high temperature applications* For applications requiring high accuracy, high reliability, and structural integrity.* Operating temperatures from -320°F to +1000°F (+1200°F short term).* Displacement systems withstand pressures up to 3500 or 5000 psi.* Dual-coil sensor design effectively minimizes radiation effects.* Hermetically sealed and laser welded.* Unaffected by environmental contaminants.
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Product
Ultraviolet Microscope
UVM-1
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The UVM-1™ is a UV microscope that also can image in the visible and NIR. This UV-visible-NIR microscope embodies both advanced optics for cutting edge UV, color and NIR imaging and visualization. The system is a flexible design, very easy to use and very durable. It is designed with cutting edge CRAIC optics for the highest image quality and to give years of service.
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Product
Light Sources
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There are many low cost artificial light sources used for illumination or for industrial applications: tungsten or halogen bulbs, fluorescent lamps, LED lamps etc. Some of these sources have regulated intensity of emitted light. However, there very few calibrated light sources of precisely known parameters. A light source can be considered as calibrated when its user can precisely regulate its photometric/radiometric parameters like luminance (or illuminance), radiance (or irradiance) at defined spectrum of interest. Such light sources are needed in many applications among them, in systems for testing night vision devices, VIS-NIR cameras and SWIR imagers. Inframet offers a series of calibrated light sources that can be divides into three groups:
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Product
Light Meter
LI-250A
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The LI-250A is a portable meter that displays the output from any LI-COR light sensor that has a cable terminated with a BNC connector. It shows instantaneous values or 15-second averages of values from a sensor.
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Product
Reading Lights
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Our Carat® lights offer a wide range of fully customized reading light solutions crafted for your unique needs.
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Product
Light Measurement
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Redesigned light sensors optimized for ecological, meteorological, solar energy, plant research, and underwater measurements.
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Product
Light Source
UVF-210S
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By traversing two light guide ends (right and left) by means of the high accuracy air cylinder, alternating irradiation of two independent positions is possible.
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Product
Light Source
UVF-204S
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This is the ultra compact and light weight high power unit fully utilizing characteristics of the high stability and long life 200watt mercury xenon lamp.
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Product
Light Touch/Tactile Switches
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Panasonic Industrial Devices Sales Company of America
Panasonic's Tactile (Light Touch) Switches are versatile and can be used in almost any user interface application.Designed in various shapes, sizes, terminals and push forces, Panasonic’s Tactile (Light Touch) Switches offer the opportunity to select the perfect Switch for the application. Each Switch is engineered for low contact resistance, small bounce noise, high contact reliability and a sharp tactile feel. Discover how designing in Panasonic Tactile Switches can enhance the Human-To-Machine interface experience.
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Product
Optical Light Sources
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A fiber optic source is commonly used with a meter to measure optical fiber attenuation or insertion loss.
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Product
Long Light Source
LM-A
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The long light source is compatible with the LM-101 or the LMC-20. The light is supplied with a 50 watt tungsten halogen convection cooled light source which provides suffcient energy for use with narrow band pass filters or monochronomators in the wave length range of .35 to 2.5 microns. The light beam is chopped at 200 hz by a quiet, vibration free, synchronous motor. The housing also contains a secondary LED light source and detector for synchronization of the amplifier, plus an electro-mechanical shutter to block the light output when the instrument is zeroed. An internal collimating lens produces a narrow beam (<1") so the LM-A can be used in bell-jar and large coating systems.
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Product
VCSEL Light Source
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ams supplies LiDAR systems with specific light sources, called VCSEL (Vertical Cavity Surface Emitting Laser). These VCSELs offer specific advantages over other types of light sources as for instance Edge Emitter Lasers:
