Inductively Coupled Plasma
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Inductively Coupled Plasma Spectrometry
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Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma
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Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Inductively Coupled Plasma Spectroscopy (ICP-OES/MS), ICP Analysis Services
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ICP-OES measures the light emitted at element-specific characteristic wavelengths from thermally excited analyte ions . This light emitted is separated and measured in a spectrometer, yielding an intensity measurement that can be converted to an elemental concentration by comparison with calibration standards. ICP-MS (ICP-Mass Spec) measures the masses of the element ions generated by the high temperature argon plasma. The ions created in the plasma are separated by their mass to charge ratios, enabling the identifcation and quantitation of unknown materials. ICP-MS offers extremely high sensitivity (i.e. low detection limits) for a wide range of elements
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
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Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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Inductively Coupled Plasma Mass Spectrometer
ICPMS-2030
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With its newly developed collision cell and optimized internal structure, the ICPMS-2030 provides superior sensitivity. At the same time, thanks to the adoption of its proprietary mini-torch unit and provision of an Eco mode, the quantity of argon gas needed for analyses has been greatly reduced to the industry's lowest levels. As a result, low running costs are assured. The Development Assistant function of the software automatically sets the optimal analysis conditions for quantitative analysis. Then, after measurements are complete, the Diagnosis Assistant function automatically checks the validity of the necessary data. While reducing the burden on the user, the efficiency of analyses is enhanced and the reliability of the data can be increased. It complies with FDA 21 CFR Part 11.
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Chemical Analysis and Corrosion Testing
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Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
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ICP Plasma System
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The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Inductively Coupled Plasma Optical Emission Spectroscopy / ICP-OES Systems
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Industry-leading performance, speed and ease of use – no compromises
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Inductively Coupled Plasma Optical Emission Spectrometer
EXPEC-6000
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An analytical technique used to determine how much of certain elements are in a sample.
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Threaded Coupling Adapter, G2, G6, G10, ITA, For Conduit Harnessing Assemblies/Clamps
410112599
Coupling Adapter
The Adapter is designed to accommodate military and commercial circular backshells for conduit or strain relief when designing for general and heavy-duty applications. The male thread size is 1.625-18 for this application.
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Inductive Sensors
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Our hygienic sensors are extremely durable against abrasive and aggressive media: their labeling is resistant to abrasion and chemicals. The luminous displays are protected against destruction and the housing construction is optimized for safe cleaning.
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Inductive Sensor
Ampstik®
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The Ampstik is easy to use and provides accurate information to anyone working with medium and high voltage. It gives line personnel the right answers so they have the ability to make decisions in the field.
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Remote Plasma Sources
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Equip your manufacturing and abatement processes with high functionality and exceptional reliability. Customize your chemistry. Expand your operating range. Deliver higher process rates. Advanced Energy’s remote plasma sources offer sophisticated options in streamlined designs.
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RF Plasma Generators
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Choose from a broad range of RF plasma generators and access unique features for configuration, control, and application requirements. From various mounts and sizes to full digital control and plasma dynamic response, our RF generators can ignite your process innovation.
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Inductive Sensors
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Wide operating temperature range. High protection rating for the requirements of harsh industrial environments. Reliable detection due to low sensor tolerances. Reduced inventory due to wide range of applications.
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Inductance Capacitance Meters
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A piece of electronic test equipment used to measure capacitance, mainly of discrete capacitors.
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Plasma Emission Controller
RU-1000
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The optical technology developed by HORIBA and the gas control technology offered by HORIBA STEC have been combined to make further advances in plasma control technology. The plasma emission controller RU-100 offers; faster deposition by controlling the transition region, optimized distribution in a large-area, high-capacity chamber, plasma stabilization in a long sputtering process (stable deposition), and mixture optimization of compounds for reactive sputtering.
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CDN - Coupling / Decoupling Networks
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The Coupling- / Decoupling Networks are used to inject common mode disturbances to Equipment under Test (EuT). Further the CDNs provide sufficient decoupling between Auxiliary Equipment (AE) and disturbance signal. The requirements for CDN and their application are described in the standard IEC 61000-4-6 (Immunity to conducted disturbances, induced by radio-frequency fields). CDNs have a common mode impedance of 150 Ohm and are available for a multitude of cable types and connectors.
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Coupling Decoupling Network
TBCDN-M1
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The TBCDN-M1 is a Coupling Decoupling Network for conducted immunity testing according to IEC 61000-4-6.
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Capacitance and Inductance Tester
JY6700
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Capacitance measurementsInstrument can test take a single capacitor without stitches in test group capacitance to bring convenience to test. It will show test results of capacitance while show test
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Thin Films, Plasma and Surface Engineering
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A residual gas analyser for vacuum process analysis. Measures the vacuum process gas composition, contamination and leak detection.
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Induction Style Control Relay
1500
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A floatless liquid level control system from B/W Controls consists of a relay of the proper type, a holder designed to support one or more electrodes or probes in the liquid container, and the corrosion resistant electrodes themselves.
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Inductive sensors
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Inductive sensors are signal generators which detect function-related movements of processing machines, robots, production lines, conveyor systems etc. in a contactless fashion, and transform them into electrical signals.
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Namur Inductive Proximity Sensor
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Shanghai Pubang Sensor Co.,Ltd.
1. NAMUR SENSOR, super low leakage current design2. Eliminate the security risks3. Suitable for inflammable and explosive dangerous areas
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Inductive Motor Control
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The inductive motor control position sensor family detects the electrical position within one pole-pair of a rotating shaft and can be used for the motor commutation of a brush-less DC (BLDC) motor. Based on the inductive sensor technology, this family measures the coupling between an excitation coil (TX) and two receiver coils (RX) via a rotating target. The coils are executed as printed circuit coils and the rotating target is a simple punched metal part. With the correct layout of the coils and the target, both synchronized to the number of pole-pair count of the motor, the IC output is proportional to the electrical angular position within one pole-pair segment with increased resolution and high performance of only 0.3° electrical INL!
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Cylindrical Compact Inductive Proximity Sensor
GX
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Panasonic Industrial Devices Sales Company of America
The GX Cylindrical Inductive Sensor Series with a built-in amplifier comes in two versions - with and without a threaded section.
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DC Coupled Differential Switching System
BS1553F(X)
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Universal Switching Corporation
The BS1553F(X) is a modular passive DC coupled differential switching system. It is designed as an automated "patch panel" for interconnecting numerous MIL-STD-1553 devices, cables and hardware, or for routing other differential signals such as '422 clock/data or kelvin ATE measurements. The I/O capacity is scalable from a small 8x8, up to 64x64 in one 5RU unit.
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Power Induction Tester
MIG-ITU-K44
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The MIG-ITU-K44 is designed for power induction testing at line frequencies of 50 and 60Hz. Power induction tests need only be performed at the frequencies of the public power supply or railway power of the country of application. Basic and enhanced level tests can be performed according to ITU-T K44.
