Inductively Coupled Plasma
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Inductively Coupled Plasma Emission Spectroscopy
Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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Inductively Coupled Plasma Spectrometry
Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Inductively Coupled Plasma Mass Spectrometer
ICPMS-2030
With its newly developed collision cell and optimized internal structure, the ICPMS-2030 provides superior sensitivity. At the same time, thanks to the adoption of its proprietary mini-torch unit and provision of an Eco mode, the quantity of argon gas needed for analyses has been greatly reduced to the industry's lowest levels. As a result, low running costs are assured. The Development Assistant function of the software automatically sets the optimal analysis conditions for quantitative analysis. Then, after measurements are complete, the Diagnosis Assistant function automatically checks the validity of the necessary data. While reducing the burden on the user, the efficiency of analyses is enhanced and the reliability of the data can be increased. It complies with FDA 21 CFR Part 11.
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Inductively Coupled Plasma Spectroscopy (ICP-OES/MS), ICP Analysis Services
ICP-OES measures the light emitted at element-specific characteristic wavelengths from thermally excited analyte ions . This light emitted is separated and measured in a spectrometer, yielding an intensity measurement that can be converted to an elemental concentration by comparison with calibration standards. ICP-MS (ICP-Mass Spec) measures the masses of the element ions generated by the high temperature argon plasma. The ions created in the plasma are separated by their mass to charge ratios, enabling the identifcation and quantitation of unknown materials. ICP-MS offers extremely high sensitivity (i.e. low detection limits) for a wide range of elements
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Inductively Coupled Plasma
Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Chemical Analysis and Corrosion Testing
Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
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Inductively Coupled Plasma Optical Emission Spectroscopy / ICP-OES Systems
Industry-leading performance, speed and ease of use – no compromises
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Threaded Coupling Adapter, G2, G6, G10, ITA, For Conduit Harnessing Assemblies/Clamps
410112599
The Adapter is designed to accommodate military and commercial circular backshells for conduit or strain relief when designing for general and heavy-duty applications. The male thread size is 1.625-18 for this application.
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ICP Plasma System
The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Inductive Sensor
HFCT Ø 30-39-50mm
Techimp HFCT is an inductive sensor for partial discharge measurements. It is suitable for on/off line PD tests on many electrical systems (cables, transformers, rotating machine, etc..). It has to be applied to the ground connection of the system to be tested.
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Plasma Process Monitors
Plasma process monitors to monitor plasma emissions during semiconductor manufacturing processes such as etching, sputtering and CVD.
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Inductive Sensor
Ampstik®
The Ampstik is easy to use and provides accurate information to anyone working with medium and high voltage. It gives line personnel the right answers so they have the ability to make decisions in the field.
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UV Plasma Sources
UVS300|UVS 10/35
The UVS300 and UVS 10/35 are UV Plasma sources with high intensity, working with different gases.
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Unclamped Inductive Load Tester
ITC55100STD
Model ITC55100STD performs ruggedness testing of power MOSFETs and IGBTs. It also tests single and dual diodes, and forward and reverse bias of IGBTs when used with an optional ITC55-RSF Output Selector Box.
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Unclamped Inductive Load Tester
ITC75300
The ITC75300 is a 400 amp version of the ITC75100 which performs ruggedness testing of power MOSFET’s, IGBT’s and diodes that conforms to MIL-STD-750 method 3470 by stressing them to controlled energy levels, accomplished by the devices driving an unclamped inductive load. Improved Test Specifications allow complete control of test parameters.
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Induction Style Control Relay
1500
A floatless liquid level control system from B/W Controls consists of a relay of the proper type, a holder designed to support one or more electrodes or probes in the liquid container, and the corrosion resistant electrodes themselves.
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Programmable Inductance Decade Box
PLS Series
The PLS Series is a broad line of high precision programmable decade inductors. They provide straight inductance in a wide selection of ranges, tolerances andratings. IET Labs also supplies custom combination substituters for capacitance and resistance as well as sources for voltage and current.
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Inductive Sensors
Wide operating temperature range. High protection rating for the requirements of harsh industrial environments. Reliable detection due to low sensor tolerances. Reduced inventory due to wide range of applications.
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Digital Displacement Inductive Sensor
EX-V Series
High-speed, high-accuracy, digital inductive displacement sensors with sub-micron resolution and an ultra-fast 40,000 samples/sec. sampling rate. Automatic Bottom-dead-center measurement mode. High-speed sampling : 40,000 samples/second. Digital Inductive Displacement Sensor
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Cylindrical Inductive Proximity Sensor
GX-M SERIES
Panasonic Industrial Devices Sales Company of America
The GX-M Series line of Cylindrical Inductive Sensors offer models with a wide range of sensing distances that are available with shielded or non-shielded 2, and 3 wiring configurations.
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Inductive Load Tester
4602-LV
There is a tendency that MOSFET has Low On Resistance so that it demands that Inductive Load Tester to have higher forcing current for measurement. The forcing current is limited by forcing voltage with previous test method. Thus it becomes difficult to test this kind of middle power range devices.
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Microwave Plasma Subsystems
AX2600 And AX2700
The AX2600 and AX2700 Microwave Plasma Delivery Subsystems are complete and highly reliable solutions for the cost-effective generation and safe delivery of atomic species to the wafer. Available in 3 kW, these highly reliable, field-proven plasma delivery subsystems deliver highly concentrated atomic species. Suitable for multiple chemistries, the high speed and precision of this plasma system’s automatic tuning guarantees immediate ignition and fast transition from plasma conditions for high productivity. Robust closed-loop control ensures high accuracy, precision, and optimal repeatability of the process from wafer to wafer and system to system.
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Inductive Sensors
Inductive Proximity Switches, self contained, depend on the output of an oscillator for their operation. The oscillator resonant circuit uses an open core coil to produce a concentrated high frequency electromagnetic (RF) field, which emerges from the active surface of the sensor. If a metal target (or other electrically conductive material) enters this field, eddy currents will be induced in it, causing the resonating oscillator to be damped.
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DC Coupled Differential Switching System
BS1553F(X)
Universal Switching Corporation
The BS1553F(X) is a modular passive DC coupled differential switching system. It is designed as an automated "patch panel" for interconnecting numerous MIL-STD-1553 devices, cables and hardware, or for routing other differential signals such as '422 clock/data or kelvin ATE measurements. The I/O capacity is scalable from a small 8x8, up to 64x64 in one 5RU unit.
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Coupling Decoupling Networks (CDN)
Beijing KeHuan Century EMC Technology Co,.LTD
Beijing KeHuan Coupling Decoupling Networks (CDN)
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Plasma Emission Controller
RU-1000
The optical technology developed by HORIBA and the gas control technology offered by HORIBA STEC have been combined to make further advances in plasma control technology. The plasma emission controller RU-100 offers; faster deposition by controlling the transition region, optimized distribution in a large-area, high-capacity chamber, plasma stabilization in a long sputtering process (stable deposition), and mixture optimization of compounds for reactive sputtering.
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